Study of the growth morphology of TiO2 thin films by AFM and TEM
- 30 May 2001
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 140 (2), 155-160
- https://doi.org/10.1016/s0257-8972(01)01029-5
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Correlation between microstructure and the optical properties of TiO2 thin films prepared on different substratesThin Solid Films, 1997
- Growth of low and high refractive index dielectric layers as studied by in situ ellipsometryThin Solid Films, 1994
- Comparative study of titanium dioxide thin films produced by electron-beam evaporation and by reactive low-voltage ion platingApplied Optics, 1993
- A novel and effective PECVD SiO/sub 2//SiN antireflection coating for Si solar cellsIEEE Transactions on Electron Devices, 1993
- Comparison of the properties of titanium dioxide films prepared by various techniquesApplied Optics, 1989
- Morphology and structure of TiO2 thin layers vs. thickness and substrate temperatureThin Solid Films, 1989
- Microstructure of vapor-deposited optical coatingsApplied Optics, 1984
- Revised structure zone model for thin film physical structureJournal of Vacuum Science & Technology A, 1984
- A simple chemical vapour deposition method for depositing thin TiO2 filmsThin Solid Films, 1983
- Refractive indices of TiO_2 films produced by reactive evaporation of various titanium–oxygen phasesApplied Optics, 1976