On the net recoil density

Abstract

The net recoil density introduced here is defined to be the number density of interstitials minus the number density of vacancies resulting from ion implantation. It is positive at large depths (excess interstitials) and negative at small depths (excess vacancies). At the target surface it has an X ^−1/2 singularity, so many moments are needed in constructing the density, and a new method had to be devised to do so. In polyatomic targets, comparison of the net recoil densities of the target constituents gives the depth dependence of changes in target stoichiometry, and perhaps changes in near-surface composition from sputtering.