High rate reactive magnetron sputter deposition of titanium oxide
- 2 June 2008
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 92 (22), 221501
- https://doi.org/10.1063/1.2938054
Abstract
A systematic experimental study of reactive sputtering from substoichiometric targets of TiOx with x ranging from 0 to 1.75 is reported. Experimental results are compared with results from modeling. The developed model describes the observed behavior and explains the origins of the unexpectedly high deposition rate. The behavior is shown to originate from the presence of titanium suboxides at the target surface caused by preferential sputtering of the oxide. The model can be used for optimization of the target composition with respect to the deposition rate and film composition in a stable hysteresis-free reactive sputtering processKeywords
This publication has 12 references indexed in Scilit:
- Understanding the discharge voltage behavior during reactive sputtering of oxidesJournal of Applied Physics, 2007
- Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitridesApplied Physics Letters, 2006
- Control of reactive sputtering processesThin Solid Films, 2005
- Eliminating the hysteresis effect for reactive sputtering processesApplied Physics Letters, 2005
- Fundamental understanding and modeling of reactive sputtering processesThin Solid Films, 2005
- Formulation for XPS spectral change of oxides by ion bombardment as a function of sputtering timeSurface Science, 2004
- High rate deposition of TiO2 by DC sputtering of the TiO2−X targetThin Solid Films, 2001
- The surface binding energy in slow collisional sputteringNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1986
- Laser fluorescence measurements of the flux density of titanium sputtered from an oxygen covered surfaceApplied Physics A, 1985
- Computer simulation of preferential sputteringNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985