Intrinsic amorphous and microcrystalline silicon by hot-wire-deposition for thin film solar cell applications
- 1 September 2001
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 395 (1-2), 305-309
- https://doi.org/10.1016/s0040-6090(01)01280-9
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
- Intrinsic microcrystalline silicon: A new material for photovoltaicsSolar Energy Materials and Solar Cells, 2000
- Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) MethodJapanese Journal of Applied Physics, 1998
- Hot-Wire CVD Poly-Silicon Films for Thin Film DevicesMRS Proceedings, 1998
- Large Area Deposition of Amorphous and Microcrystalline Silicon by Very High Frequency PlasmaMRS Proceedings, 1998
- Electronic Properties and Device Applications of Hot-Wire CVD Polycrystalline Silicon FilmsMRS Proceedings, 1997
- Hydrogen in amorphous and microcrystalline silicon films prepared by hydrogen dilutionJournal of Applied Physics, 1996
- On the Way Towards High Efficiency Thin Film Silicon Solar Cells by the “Micromorph” ConceptMRS Proceedings, 1996
- Power Feeding in Large Area PECVD of Amorphous SiliconMRS Proceedings, 1995
- Effects of Hydrogen Atoms on Passivation and Growth of Microcrystalline SiMRS Proceedings, 1989
- Reinterpretation of the silicon-hydrogen stretch frequencies in amorphous siliconSolid State Communications, 1983