Phase formation and dissociation in the thin-film Pd/Al system
- 15 September 1987
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 62 (6), 2269-2274
- https://doi.org/10.1063/1.339482
Abstract
Phase formation has been investigated for thin films in the following systems: Al/Pd, Pd2Al/Al and Pd/PdAl/Al between 200 and 450 °C. The films were prepared by sequential evaporation and coevaporation, annealed under vacuum, and analyzed by Rutherford backscattering and x-ray diffraction. Pd2Al3 is the dominant growing phase in the initial stages of the reaction for these samples. Al is the dominant moving species during the formation of Pd2Al3.Keywords
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