Single crystalline CoSi2 layers formed by Co implantation into Si
- 1 September 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 38 (1-4), 197-206
- https://doi.org/10.1016/0169-4332(89)90539-4
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- Mesotaxy: Single-crystal growth of buried CoSi2 layersApplied Physics Letters, 1987
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- The Formation of Thin Layers and Double Heterostructures of Epitaxial SilicidesMRS Proceedings, 1986
- Formation of thin films of CoSi2: Nucleation and diffusion mechanismsThin Solid Films, 1985
- Kinetics of CoSi2 from evaporated siliconApplied Physics A, 1984