Kinetics of CoSi2 from evaporated silicon
- 1 August 1984
- journal article
- Published by Springer Nature in Applied Physics A
- Vol. 34 (4), 249-251
- https://doi.org/10.1007/bf00616581
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Low Temperature Formation of Nisi2 from Evaporated SiliconPhysica Status Solidi (a), 1984
- Kinetics of TiSi2 formation by thin Ti films on SiJournal of Applied Physics, 1983
- Surface morphology and electronic properties of ErSi2Thin Solid Films, 1983
- Heat of crystallization and melting point of amorphous siliconApplied Physics Letters, 1983
- Transition temperatures and heats of crystallization of amorphous Ge, Si, and Ge1−xSix alloys determined by scanning calorimetryJournal of Applied Physics, 1981
- Silicon/metal silicide heterostructures grown by molecular beam epitaxyApplied Physics Letters, 1980
- Interactions in the Co/Si thin-film system. I. KineticsJournal of Applied Physics, 1978
- Cobalt silicide layers on Si. I. Structure and growthJournal of Applied Physics, 1975