In situ neutron diffraction study of lattice deformation during oxygen precipitation in silicon
- 1 August 1991
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 70 (3), 1276-1280
- https://doi.org/10.1063/1.350336
Abstract
We present the first in situ measurement of the evolution of strain fields due to oxygen precipitation in silicon single crystals by means of high‐resolution neutron backscattering. The integrated reflecting power R and the lattice parameter variations Δd/d which are directly related to the strain fields have been measured as a function of temperature and annealing time. In the temperature range from 300 to 1185 K, high purity float zone crystals maintain the R‐values characteristic for perfect crystals. In contrast, Czochralski‐grown crystals which contain on the order of 1018 oxygen atoms cm−3 (20 ppm), show a steep increase in reflectivity starting at 1160 K, and which goes through a maximum at 1350 K. At 1456 K, partial annealing occurs with a time constant of several hours.Keywords
This publication has 13 references indexed in Scilit:
- Orientation of oxygen precipitates in siliconSemiconductor Science and Technology, 1990
- A study of oxygen precipitation in silicon using high-resolution transmission electron microscopy, small-angle neutron scattering and infrared absorptionPhilosophical Magazine Part B, 1989
- Anisotropic small-angle neutron scattering from oxide precipitates in silicon single crystalsSemiconductor Science and Technology, 1989
- Annealed Czochralski grown silicon crystals: A new material for the monochromatisation of synchrotron radiation and X-rays above 60 keVNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1988
- Precipitation of oxygen at 485 °C: Direct evidence for accelerated diffusion of oxygen in silicon?Journal of Applied Physics, 1985
- An infrared and neutron scattering analysis of the precipitation of oxygen in dislocation-free siliconJournal of Physics C: Solid State Physics, 1984
- Nucleation temperature of large oxide precipitates in as-grown Czochralski silicon crystalJournal of Crystal Growth, 1982
- Diffusion-limited growth of oxide precipitates in czochralski silisonJournal of Crystal Growth, 1980
- Effects of ambients on oxygen precipitation in siliconApplied Physics Letters, 1980
- Impurity Clustering Effects on the Anomalous Transmission of X Rays in SiliconJournal of Applied Physics, 1963