Absolute photon yields in the sputter-induced optical emission process
- 15 December 1978
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 33 (12), 999-1002
- https://doi.org/10.1063/1.90268
Abstract
The absolute photon yield expressed as the number of photons emitted at a particular wavelength per sputtered atom has been measured for 34 elements in NBS standard glass targets bombarded by 20‐keV Ar+ ions. The yield values lie in the range 10−2–10−6. The detection limits for these elements in parts per million by weight have also been estimated for given bombardment conditions.Keywords
This publication has 12 references indexed in Scilit:
- Obsidian Hydration Profiles Measured by Sputter-Induced Optical EmissionScience, 1978
- Hydrogen and fluorine profiles in GdF3 films measured by sputter-induced optical emissionApplied Physics Letters, 1978
- The use of sputter-induced emission spectroscopy for the analysis of hydrogen in solidsNuclear Instruments and Methods, 1978
- The excitation efficiency of atoms ejected during ion-beam sputteringSurface Science, 1977
- In situ spectrochemical analysis of solid surfaces by ion beam sputteringAnalytical Chemistry, 1977
- Continuum optical radiation produced by low-energy heavy particle bombardment of metal targetsNuclear Instruments and Methods, 1976
- Ion-beam-induced radiation applied to investigations of thin surface layers on glass substratesJournal of Non-Crystalline Solids, 1975
- Effects of nonradiative de-excitation of excited sputtered atoms near silicon and silicon dioxide surfacesSurface Science, 1975
- Quantum Efficiency and Instrumental Polarization of an Optical MonochromatorApplied Optics, 1974
- Photon emission from low-energy ion and neutral bombardment of solidsRadiation Effects, 1973