Photolithography with transparent reflective photomasks
- 1 January 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (1), 98-103
- https://doi.org/10.1116/1.589842
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
- Using an elastomeric phase mask for sub-100 nm photolithography in the optical near fieldApplied Physics Letters, 1997
- Replica molding using polymeric materials: A practical step toward nanomanufacturingAdvanced Materials, 1997
- Micromachining Sensors for Electrochemical Measurement in Subnanoliter VolumesAnalytical Chemistry, 1997
- Electrochemical Analysis in Picoliter MicrovialsAnalytical Chemistry, 1997
- Fabrication of three‐dimensional micro‐structures: Microtransfer moldingAdvanced Materials, 1996
- Complex Optical Surfaces Formed by Replica Molding Against Elastomeric MastersScience, 1996
- Peer Reviewed: Silicon Micromachining: Sensors to SystemsAnalytical Chemistry, 1996
- Polymer microstructures formed by moulding in capillariesNature, 1995
- Lithographic molding: A convenient route to structures with sub‐micrometer dimensions**Advanced Materials, 1995
- Ultramicroelectrodes in ElectrochemistryAngewandte Chemie International Edition in English, 1993