Optical thickness measurement of SiO2Si3N4 films on silicon
- 31 July 1967
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 10 (7), 625-632
- https://doi.org/10.1016/0038-1101(67)90092-5
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Non-destructive measurement of glass on silicon dioxide through near-infrared (NIR) interferenceSolid-State Electronics, 1966
- Optical Thickness Measurement of Thin Transparent Films on SiliconJournal of Applied Physics, 1965
- Interspecimen Comparison of the Refractive Index of Fused Silica*,†Journal of the Optical Society of America, 1965
- Thickness measurement of silicon dioxide layers by ultraviolet-visible interference methodSolid-State Electronics, 1964
- Nondestructive Determination of Thickness and Refractive Index of Transparent FilmsIBM Journal of Research and Development, 1964