Characterization of multilayered tungsten/carbon thin films by various processes
- 15 February 1988
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 63 (4), 1191-1195
- https://doi.org/10.1063/1.339978
Abstract
A series of multilayered thin films were obtained by triode sputtering from a W and C target in an alternating fashion. The films were analyzed by Auger spectroscopy. The resistance of the films was studied versus three parameters: aging, number n of layers, and temperature. The resistance of the stack varied linearly with n−1. This indicates the good repeatability of the geometrical characteristics of each pair. The electrical behavior of the multilayers is shown to be anisotropic. In particular it was shown that W/C multilayers have a negative TCR (temperature coefficient of resistance) in the longitudinal direction and a positive TCR in the transverse direction. A study made on transmittance in visible range showed no anomalies.Keywords
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