Growth of thin SiO2 films on clean Si (111) surfaces by low-pressure oxidation and their evaporation
- 16 September 1977
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 43 (1), 141-150
- https://doi.org/10.1002/pssa.2210430114
Abstract
No abstract availableKeywords
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