Oxygen sticking coefficients on clean (111) silicon surfaces
- 30 June 1969
- journal article
- Published by Elsevier in Surface Science
- Vol. 15 (2), 303-312
- https://doi.org/10.1016/0039-6028(69)90153-8
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
- The relation between current flow and oxygen adsorption in a reverse biassed silicon pn junctionSurface Science, 1967
- PREPARATION OF ATOMICALLY CLEAN SURFACES OF Si AND Ge BY HEATING IN VACUUMApplied Physics Letters, 1965
- Room temperature oxidation of silicon during and after etchingJournal of Physics and Chemistry of Solids, 1965
- Measurement of oxygen adsorption on silicon by ellipsometryJournal of Physics and Chemistry of Solids, 1965
- Oxygen Adsorption on Silicon and GermaniumJournal of Applied Physics, 1961
- The adsorption of oxygen on clean silicon surfacesJournal of Physics and Chemistry of Solids, 1960
- Structure and Adsorption Characteristics of Clean Surfaces of Germanium and SiliconThe Journal of Chemical Physics, 1959
- Adsorption of Oxygen on SiliconThe Journal of Chemical Physics, 1959
- Work function and emission studies on clean silicon surfacesJournal of Physics and Chemistry of Solids, 1959
- Germanium and silicon surfacesJournal of Physics and Chemistry of Solids, 1959