Effects of process parameters on titanium dioxide thin film deposited using ECR MOCVD
- 1 October 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 287 (1-2), 120-124
- https://doi.org/10.1016/s0040-6090(96)08784-6
Abstract
No abstract availableKeywords
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