Atom incorporation at surface clusters: An atomic view
- 28 October 1991
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 67 (18), 2509-2512
- https://doi.org/10.1103/physrevlett.67.2509
Abstract
Observations have been made of the incorporation of single iridium atoms into ascending as well as descending steps at iridium clusters on Ir(111). At ascending steps, incorporation occurs once diffusion of adatoms becomes significant. At descending steps, it is more complicated, and proceeds differently on large compared to small (12-atom) clusters. The mechanism of incorporation has been tested in experiments with tungsten atoms. These reveal that incorporation at descending steps can occur by exchange of the adatom with a cluster atom rather than by simple jumps.Keywords
This publication has 14 references indexed in Scilit:
- Reentrant layer-by-layer growth during molecular-beam epitaxy of metal-on-metal substratesPhysical Review Letters, 1990
- Mechanisms for annealing of ion-bombardment-induced defects on Pt(111)Physical Review B, 1990
- Observation of sputtering damage on Au(111)Surface Science, 1990
- Rate equation modelling of epitaxial growthSurface Science, 1989
- Self-adsorption sites on a close-packed surface: Ir on Ir(111)Physical Review Letters, 1989
- Adatom diffusion on W(211): Re, W, Mo, Ir, and RhSurface Science, 1988
- Atom binding at overlayers: Re on W(211)Surface Science, 1986
- Adsorption of transition adatoms on a stepped BCC transition-metal surfaceJournal of Physics C: Solid State Physics, 1985
- Lattice steps and adatom binding on W(211)Surface Science, 1984
- Measurement of the barrier height of the reflective W {110} plane boundaries in surface diffusion of single atomsSurface Science, 1982