Effect of Steady Bias Light on Carrier Lifetime in Silicon Wafers with Chemically Passivated Surfaces
- 1 February 1996
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 35 (2A), L133-135
- https://doi.org/10.1143/jjap.35.l133
Abstract
We found that even a silicon surface chemically passivated with ethanol-iodine solution represents an active state in the recombination process of excess carriers. Hence, the decay of excess carriers is not a simple exponential decay and the time constant of decay depends strongly on the injection level of excess carriers. This injection-dependent nonexponential decay can be eliminated by illumination with a weak steady bias light. In other words, we recommend the use of a bias light illumination for measurements of bulk carrier lifetime with the technique of chemical passivation, since the illumination results in a low surface recombination velocity of below 5.5 cm/s in a wide range of injection level of 1–200%.Keywords
This publication has 5 references indexed in Scilit:
- Measurable Range of Bulk Carrier Lifetime for a Thick Silicon Wafer by Induced Eddy Current MethodJapanese Journal of Applied Physics, 1995
- Contactless Measurement of Carrier Lifetime in Silicon Thick WafersJapanese Journal of Applied Physics, 1993
- In situ bulk lifetime measurement on silicon with a chemically passivated surfaceApplied Surface Science, 1993
- Unusually Low Surface-Recombination Velocity on Silicon and Germanium SurfacesPhysical Review Letters, 1986
- Contactless Measurement of Photoinduced Carrier Lifetime and Injection Level in Silicon Wafer Using Additional Eddy CurrentJapanese Journal of Applied Physics, 1983