Chemical effects induced by ion implantation in molecular solids
- 15 May 1983
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research
- Vol. 209-210, 87-96
- https://doi.org/10.1016/0167-5087(83)90786-x
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
- Ion beam exposure characteristics of resists: Experimental resultsJournal of Applied Physics, 1982
- The erosion of frozen argon by swift helium ionsNuclear Instruments and Methods in Physics Research, 1981
- Sputtering of Van der Waals moleculesPhysics Letters A, 1981
- Effect of ion energy on the implantation products of benzeneChemical Physics Letters, 1981
- Desorption of organic compounds from solid surfaces by bombardment with heavy ions from a tandem acceleratorSurface Science, 1980
- Energy dependence of the erosion of H2O ice films by H and He ionsNuclear Instruments and Methods, 1980
- Chemical effects of ion implantation on solid benzeneChemical Physics Letters, 1980
- A thermalized ion explosion model for high energy sputtering and track registrationRadiation Effects, 1980
- Sputtering of uranium tetrafluoride in the electronic stopping regionRadiation Effects, 1980
- Sputtering of potassium chloride by H, He, and Ar ionsNuclear Instruments and Methods, 1976