Abstract
Monolithically etched‐facet‐mirror GaInAsP/InP stripe lasers (1.3 μm) were made using a wet chemical etching technique. Lasers with 20 μm stripes have current thresholds of 300 mA (room temperature, pulsed) about 50% higher than comparable cleaved‐mirror lasers. Nearly single‐mode operation up to 1.51th has been achieved with a cavity length of ∼180 μm.