Preparation of TiO2 Thin Film Photocatalysts Working under Visible Light Irradiation by Applying a RF Magnetron Sputtering Deposition Method.
- 1 January 2001
- journal article
- Published by Surface Science Society Japan in Hyomen Kagaku
- Vol. 22 (9), 561-565
- https://doi.org/10.1380/jsssj.22.561
Abstract
No abstract availableKeywords
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