Negative-Ucenters in 4Hsilicon carbide
- 15 October 1998
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 58 (16), R10119-R10122
- https://doi.org/10.1103/physrevb.58.r10119
Abstract
Characterization of two negative-U centers in 4H SiC has been performed using various capacitance transient techniques. Each center gives rise to one acceptor level (-/0) and one donor level (0/+), where the electron ionization energy of the acceptor level is larger than that of the donor level. The two-electron emissions from the two acceptor levels give rise to the previously reported deep level transient spectroscopy peak associated with the so-called center. Direct evidence for the inverted ordering and temperature dependence studies of the electron-capture cross sections of the acceptor levels will be presented.
Keywords
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