One-level gray-tone design — Mask data preparation and pattern transfer
- 1 January 1996
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 30 (1-4), 559-562
- https://doi.org/10.1016/0167-9317(95)00309-6
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Fabrication of monolithic diffractive optical elements by the use of e-beam direct write on an analog resist and a single chemically assisted ion-beam-etching stepApplied Optics, 1995
- Simulation assisted design of processes for gray-tone lithographyMicroelectronic Engineering, 1995
- Microfabrication of complex surface topographies using grey-tone lithographySensors and Actuators A: Physical, 1995