Simulation assisted design of processes for gray-tone lithography
- 28 February 1995
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 27 (1-4), 267-270
- https://doi.org/10.1016/0167-9317(94)00104-3
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- One-step 3D shaping using a gray-tone mask for optical and microelectronic applicationsMicroelectronic Engineering, 1994
- Simulation of lithographic images and resist profilesMicroelectronic Engineering, 1990
- Design Of A Positive Photoresist For Submicron Imaging Assisted By SAMPLE SimulationPublished by SPIE-Intl Soc Optical Eng ,1988