Growth rate of titanium carbide whiskers in chemical vapor deposition
- 1 March 1977
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 37 (3), 293-300
- https://doi.org/10.1016/0022-0248(77)90123-3
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
- Crystal growth of titanium nitride by chemical vapor depositionJournal of Crystal Growth, 1975
- Growth and crystallographic features of titanium carbide whiskersJournal of Crystal Growth, 1974
- Chemical vapor deposition in the titanium-carbon systemJournal of the Less Common Metals, 1971
- Single Crystal Growth of Titanium Carbide by Chemical Vapor DepositionJournal of the Electrochemical Society, 1970
- Formation of Silicon and Titanium Carbides by Chemical Vapor DepositionJournal of the American Ceramic Society, 1968
- The Chemical Vapor Deposition of Titanium Carbide Coatings on IronJournal of the Electrochemical Society, 1967
- The stability and chemical reactivity of titanium nitride and titanium carbideTransactions of the Faraday Society, 1950
- The Vapor-Phase Deposition of Refractory MaterialsJournal of the Electrochemical Society, 1949
- Über die Bildung hochschmelzender Metallcarbide beim Glühen eines Kohlenfadens im Dampf einer flüchtigen Halogenverbindung des MetallesZeitschrift für anorganische und allgemeine Chemie, 1934
- Darstellung von reinem Titanium‐, Zirkonium‐, Hafnium‐ und ThoriummetallZeitschrift für anorganische und allgemeine Chemie, 1925