Effect of microstructure and crystallinity on the photocatalytic activity of TiO2thin films deposited by dc magnetron sputtering
- 16 August 2007
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 40 (17), 5232-5238
- https://doi.org/10.1088/0022-3727/40/17/033
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- The effect of argon pressure on the structural and photocatalytic characteristics of TiO2 thin films deposited by d.c. magnetron sputteringThin Solid Films, 2006
- Photocatalytic Activity of Sol−Gel TiO2 Thin Films on Various Kinds of Glass Substrates: The Effects of Na+ and Primary Particle SizeThe Journal of Physical Chemistry B, 2004
- Photoinduced reactivity of titanium dioxideProgress in Solid State Chemistry, 2004
- The design and development of highly reactive titanium oxide photocatalysts operating under visible light irradiationJournal of Catalysis, 2003
- TiO2 films prepared by DC magnetron sputtering from ceramic targetsVacuum, 2002
- Effect of surface structure on photocatalytic activity of TiO2 thin films prepared by sol-gel methodThin Solid Films, 2000
- TiO2−X sputter for high rate deposition of TiO2Vacuum, 2000
- High rate sputter deposition of TiO 2 from TiO 2−x targetThin Solid Films, 1999
- An overview of semiconductor photocatalysisJournal of Photochemistry and Photobiology A: Chemistry, 1997
- Dependence of TiO2 Photocatalytic Activity upon Its Film ThicknessLangmuir, 1997