High rate sputter deposition of TiO 2 from TiO 2−x target
- 1 August 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 351 (1-2), 57-60
- https://doi.org/10.1016/s0040-6090(99)00207-2
Abstract
No abstract availableKeywords
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