Anisotropy of infrared-upconversion luminescence generation in porous silicon
- 15 August 1993
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 48 (8), 5653-5656
- https://doi.org/10.1103/physrevb.48.5653
Abstract
It is demonstrated that the infrared-upconversion luminescence generation from porous silicon, which was considered as an enhanced third-order nonlinear optical effect in our recent work, is anisotropic as the polarization vector of normally incident fundamental light is rotated. A new method was used to determine the anisotropy parameter σ of the third-order nonlinear optical tensor . Due to the sensitivity of σ to the crystal structure and microscopic electronic properties, the difference of σ between porous silicon and crystalline silicon, particularly of their phases, demonstrates that the nanometer structure of porous silicon induces a dramatic change of the electronic band structure, but the strong anisotropic crystal property remains.
Keywords
This publication has 17 references indexed in Scilit:
- Characterization of photoluminescent porous Si by small-angle scattering of x raysApplied Physics Letters, 1992
- Correlation between silicon hydride species and the photoluminescence intensity of porous siliconApplied Physics Letters, 1992
- Photoluminescence studies on porous siliconApplied Physics Letters, 1992
- Electronic structure of light-emitting porous SiApplied Physics Letters, 1992
- The origin of visible luminescencefrom “porous silicon”: A new interpretationSolid State Communications, 1992
- Visible electroluminescence from porous siliconApplied Physics Letters, 1992
- Correlation of Raman and photoluminescence spectra of porous siliconApplied Physics Letters, 1992
- Electroluminescence in the visible range during anodic oxidation of porous silicon filmsApplied Physics Letters, 1991
- Porous silicon formation: A quantum wire effectApplied Physics Letters, 1991
- Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafersApplied Physics Letters, 1990