Comparison of Pulsed and Continuous-Wave Deposition of Thin Films from Saturated Fluorocarbon/H2 Inductively Coupled rf Plasmas
- 1 January 1997
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 9 (1), 349-362
- https://doi.org/10.1021/cm960388q
Abstract
No abstract availableKeywords
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