Measurements on the electrical transport properties in CoSi2 and NiSi2 formed by thin film reactions
- 1 March 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 125 (1-2), 93-99
- https://doi.org/10.1016/0040-6090(85)90400-6
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Electrical transport properties of CoSi2 and NiSi2 thin filmsApplied Physics Letters, 1984
- Electrical properties of thin Co2Si, CoSi, and CoSi2 layers grown on evaporated siliconJournal of Electronic Materials, 1984
- Electrical characteristics of thin Ni2Si, NiSi, and NiSi2 layers grown on siliconJournal of Electronic Materials, 1983
- Photoemission and band-structure results for NiPhysical Review B, 1982