The initial mechanisms of Al2O3 atomic layer deposition on OH/Si(100)-2×1 surface by tri-methylaluminum and water
- 4 August 2006
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 426 (4-6), 365-369
- https://doi.org/10.1016/j.cplett.2006.05.126
Abstract
No abstract availableKeywords
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