Formation of nanopores in a SiN∕SiO2 membrane with an electron beam
- 7 September 2005
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 87 (11)
- https://doi.org/10.1063/1.2043247
Abstract
An electron beam can drill nanopores in SiO2 or silicon nitride membranes and shrink a pore to a smaller diameter. Such nanopores are promising for single molecule detection. The pore formation in a 40?nm thick silicon nitride?SiO2 bilayer using an electron beam with a diameter of 8?nm (full width of half height) was investigated by electron energy loss spectroscopy with silicon nitride facing toward and away from the source. The O loss shows almost linear—independent of which layer faces the source, while N loss is quite complicated. After the formation of a pore, the membrane presents a wedge shape over a 70?nm radius around the nanoporeKeywords
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