The effects of extended heat treatment on Ni induced lateral crystallization of amorphous silicon thin films
- 1 January 1999
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 46 (1), 78-82
- https://doi.org/10.1109/16.737444
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
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