Introducing atomic layer epitaxy for the deposition of optical thin films
- 1 November 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 289 (1-2), 250-255
- https://doi.org/10.1016/s0040-6090(96)08890-6
Abstract
No abstract availableKeywords
This publication has 34 references indexed in Scilit:
- Atomic layer epitaxy growth of titanium dioxide thin films from titanium ethoxideChemistry of Materials, 1994
- Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin filmsChemistry of Materials, 1993
- Growth of titanium dioxide thin films by atomic layer epitaxyThin Solid Films, 1993
- Deposition of optical coatings by laser-assisted evaporation and by photo-assisted chemical vapor depositionThin Solid Films, 1992
- Atomic layer epitaxyThin Solid Films, 1992
- Metallorganic chemical vapor deposition: a new era in optical coating technologyMaterials Chemistry and Physics, 1992
- Improvement of abrasion resistance of SiO_2/TiO_2 multilayer interference filtersApplied Optics, 1989
- Atomic layer epitaxyMaterials Science Reports, 1989
- Ion-based methods for optical thin film depositionJournal of Materials Science, 1986
- Physical and chemical aspects in the application of thin films on optical elementsApplied Optics, 1984