Electronic structure of dangling and floating bonds in amorphous silicon
- 2 October 1989
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 63 (14), 1491-1494
- https://doi.org/10.1103/physrevlett.63.1491
Abstract
The electronic structure of amorphous silicon models has been calculated with the tight-binding parameters of Chadi. An energy gap of ∼1.0 eV is obtained for a fully four-coordinated model, whereas gap states occur for models with coordination defects. Dangling-bond gap states are well localized on the three-coordinated site. Floating bonds lead to considerably less localized gap states with wave-function amplitudes on the neighbors of the five-coordinated atom. The hyperfine splittings of these coordination defects are calculated and compared to experiment.Keywords
This publication has 20 references indexed in Scilit:
- Energy levels and charge distributions of nonideal dangling and floating bonds in amorphous SiPhysical Review B, 1989
- Defect states at floating and dangling bonds in amorphous SiPhysical Review B, 1988
- Dangling or floating bonds in amorphous silicon?Physical Review Letters, 1988
- Quantitative analysis of EPR and electron-nuclear double resonance spectra ofDcenters in amorphous silicon: Dangling versus floating bondsPhysical Review B, 1988
- Generation of amorphous-silicon structures with use of molecular-dynamics simulationsPhysical Review B, 1987
- Comment on ‘‘Defects in amorphous silicon: A new perspective’’Physical Review Letters, 1987
- Mechanisms for peculiar low-temperature phenomena in hydrogenated amorphous siliconPhysical Review Letters, 1987
- Structural and vibrational properties of a realistic model of amorphous siliconPhysical Review B, 1987
- Defects in Amorphous Silicon: A New PerspectivePhysical Review Letters, 1986
- Computer Generation of Structural Models of Amorphous Si and GePhysical Review Letters, 1985