Low temperature growth of highly transparent c-axis oriented ZnO thin films by pulsed laser deposition
- 31 August 1994
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 25 (2-4), 321-326
- https://doi.org/10.1016/0167-9317(94)90032-9
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- Effects of Optical Confinement in Textured Antireflection Coating using ZnO Films for Solar CellsJapanese Journal of Applied Physics, 1992
- Piezoelectric Characteristics of ZnO Films Deposited Using an Electron Cyclotron Resonance Sputtering SystemJapanese Journal of Applied Physics, 1992
- Deposition of Aluminum-Doped Zinc Oxide Thin Films by Spray PyrolysisJapanese Journal of Applied Physics, 1992
- The Electrical and Optical Properties of the ZnO-SnO2 Thin Films Prepared by RF Magnetron SputteringPhysica Status Solidi (a), 1992
- Optical properties of ZnO : Al films prepared by reactive dc magnetron sputteringVacuum, 1991
- High-rate (∼50-Å/s) deposition of ZnO films for amorphous silicon alloy solar-cell back-reflector applicationJournal of Applied Physics, 1991
- Preparation and characterization of Li-doped ZnO filmsJournal of Vacuum Science & Technology A, 1991
- ZnO processing for integrated optic sensorsThin Solid Films, 1986
- Laser-induced sputtering of ZnO, TiO2, CdSe and GaP near threshold laser fluenceSurface Science, 1983
- Vacuum Deposited Thin Films Using a Ruby LaserApplied Optics, 1965