The growth of polycrystalline silicon films by low pressure chemical vapour deposition at relatively low temperatures
- 1 September 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 163, 249-254
- https://doi.org/10.1016/0040-6090(88)90431-2
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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