Fabrication of a gray-tone mask and pattern transfer in thick photoresists
- 1 June 1998
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 8 (2), 95-98
- https://doi.org/10.1088/0960-1317/8/2/013
Abstract
A low-cost gray-tone mask fabrication for thick resist UV lithography is described. The experimental relation between the theoretical transmission and the remaining resist thickness after development is presented.Keywords
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