The depth of sputtering damage in tungsten by field-ion microscopy
- 1 January 1979
- journal article
- Published by Taylor & Francis in Radiation Effects
- Vol. 45 (1), 111-118
- https://doi.org/10.1080/00337577908208416
Abstract
No abstract availableKeywords
This publication has 29 references indexed in Scilit:
- Festkörperzerstäubung durch IonenbeschußPublished by Springer Nature ,2007
- Depth profiles of ion-induced structural changes in diamond from X-ray photoelectron spectroscopyProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1978
- The optimum ion species for sputter-cleaning or ion profiling tungsten surfacesSurface Technology, 1976
- An in situ field‐ion microscope research of radiation damage in tungstenJournal of Microscopy, 1976
- Depth distribution of energy deposition by ion bombardmentComputer Physics Communications, 1974
- The direct observation of point defects in irradiated or quenched metals by quantitative field ion microscopyJournal of Physics F: Metal Physics, 1973
- Field-Ion Microscopy of Tungsten Bombarded by Low-Energy Argon IonsCanadian Journal of Physics, 1972
- The penetration of lattice defects in copper and gold foils bombarded with 1–5 keV argon ionsCanadian Journal of Physics, 1968
- THE IONIC ENTRAPMENT AND THERMAL DESORPTION OF INERT GASES IN TUNGSTEN FOR KINETIC ENERGIES OF 40 EV TO 5 KEVCanadian Journal of Physics, 1964
- Generation of clean surfaces in high vacuumBritish Journal of Applied Physics, 1963