Low-Energy Depth Distributions in Pt, Al, and KCl as Obtained by Sputtering

Abstract

Depth‐distribution measurements have been made by means of the sputtering technique with Pt, Al, and KCl, in all cases following low‐energy labelings with Kr containing ⁸⁵Kr. The observed values of R_m, the median or 50% range, were with Pt 14 Å at 3 keV and 59 Å at 9 keV; with Al they were 56 Å at 4 keV and 101 Å at 10 keV; and with KCl they were 9 Å for Tesla energies, 38 Å at 2 keV, 67 Å at 4 keV, and 105 Å at 10 keV. It was possible to show that gas sputtering and related effects probably did not play an important role in the experiments. Thus, the ranges (a) were, in general, comparable to those obtained using electrochemical techniques, (b) were independent of the sputtering energy (shown with KCl), and (c) were in a similar proportion to each other as required from dissolution experiments (shown with KCl).