Crystal growth and microstructure of polycrystalline Ti1−xAlxN alloy films deposited by ultra-high-vacuum dual-target magnetron sputtering
- 1 November 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 235 (1-2), 62-70
- https://doi.org/10.1016/0040-6090(93)90244-j
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- Design and characterization of a compact two-target ultrahigh vacuum magnetron sputter deposition system: Application to the growth of epitaxial Ti1−xAlxN alloys and TiN/Ti1−xAlxN superlatticesJournal of Vacuum Science & Technology A, 1993
- Oxidation of metastable single-phase polycrystalline Ti0.5Al0.5N films: Kinetics and mechanismsJournal of Applied Physics, 1990
- Computer simulation of recrystallization—II. Heterogeneous nucleation and growthActa Metallurgica, 1988
- Selective oxidation and chemical state of Al and Ti in (Ti, Al)n coatingsSurface and Interface Analysis, 1988
- Electrostatic Probe Measurements in the Glow Discharge Plasma of a D. C. Magnetron Sputtering SystemContributions to Plasma Physics, 1988
- Material selection for hard coatingsJournal of Vacuum Science & Technology A, 1986
- Morphology and properties of sputtered (Ti,Al)N layers on high speed steel substrates as a function of deposition temperature and sputtering atmosphereJournal of Vacuum Science & Technology A, 1986
- On structure and properties of sputtered Ti and Al based hard compound filmsJournal of Vacuum Science & Technology A, 1986
- The ternary system titanium-aluminum-nitrogenJournal of Solid State Chemistry, 1984
- Electron densities and chemical bonding in TiC, TiN, and TiO derived from energy band calculationsInternational Journal of Quantum Chemistry, 1983