A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments
- 1 August 1996
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 80 (3), 1337-1344
- https://doi.org/10.1063/1.362932
Abstract
No abstract availableKeywords
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