Interfacial reaction of a-Si with various Schottky metals
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 521-524
- https://doi.org/10.1016/0022-3093(83)90635-x
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Characterization of amorphous silicon films by Rutherford backscattering spectrometryNuclear Instruments and Methods, 1980
- Schottky-barrier characteristics of metal–amorphous-silicon diodesApplied Physics Letters, 1976
- Formation of silicon oxide over gold layers on silicon substratesJournal of Applied Physics, 1972