Low Stress Tungsten Absorber for X-ray Masks
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4), 303-308
- https://doi.org/10.1016/0167-9317(90)90119-e
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- The investigation of mixed halogen freon/oxygen tungsten reactive ion etching chemistries with extension to siliconJournal of Vacuum Science & Technology B, 1989
- Use of ion implantation to eliminate stress-induced distortion in x-ray masksJournal of Vacuum Science & Technology B, 1988
- Reduction in x-ray mask distortion using amorphous WNx absorber stress compensated with ion bombardmentJournal of Vacuum Science & Technology B, 1988
- Improved tungsten absorber technology for sub-half-micron x-ray lithographyMicroelectronic Engineering, 1987
- Influence of absorber stress on the precision of x-ray masksJournal of Vacuum Science & Technology B, 1986