Enhanced Step Coverage of SiO2 Films Sputtered in Hydrogen-Argon Mixed Gas
- 1 May 1980
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 19 (5), L259
- https://doi.org/10.1143/jjap.19.l259
Abstract
Step coverage of magnetron sputtered SiO2 films prepared in 30% hydrogen-70% argon mixed gases has been investigated in comparison with that in argon only. The following results were obtained. (1) In pure argon, the step coverage profile has a vertical slope with microcrack at the step. (2) By mixing hydrogen in argon, step coverage is improved to a positive slope profile without microcracks, and the film at the step is densified.Keywords
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