Properties of alumina films prepared by low-pressure metal-organic chemical vapour deposition
- 1 May 1995
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 72 (1-2), 13-22
- https://doi.org/10.1016/0257-8972(94)02328-n
Abstract
No abstract availableKeywords
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