Ion energy and anisotropy in microwave plasma etching of polymers
- 31 December 1986
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 5 (1-4), 363-374
- https://doi.org/10.1016/0167-9317(86)90065-1
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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