Investigation of the precursors of a-Si:H films produced by decomposition of silane on hot tungsten surfaces
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 137-138, 661-664
- https://doi.org/10.1016/s0022-3093(05)80207-8
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Deposition of device quality, low H content amorphous siliconJournal of Applied Physics, 1991
- Reactions of silane with the W(110) surfaceSurface Science, 1990
- Deposition of a-Si:H by high temperature thermal decomposition of silaneJournal of Non-Crystalline Solids, 1989
- Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous siliconJournal of Applied Physics, 1989
- Production of high-quality amorphous silicon films by evaporative silane surface decompositionJournal of Applied Physics, 1988
- Thermal desorption of silicon from polycrystalline tungsten surfacesSurface Science, 1984