Deposition of a-Si:H by high temperature thermal decomposition of silane
- 1 December 1989
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 114, 187-189
- https://doi.org/10.1016/0022-3093(89)90108-7
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous siliconJournal of Applied Physics, 1989
- Improvement of the photoelectric properties of amorphous SiCx:H by using disilylmethane as a feeding gasApplied Physics Letters, 1989
- Influence of microstructure on the photoconductivity of glow discharge deposited amorphous SiC:H and amorphous SiGe:H alloysApplied Physics Letters, 1987
- Reinterpretation of the silicon-hydrogen stretch frequencies in amorphous siliconSolid State Communications, 1983
- a-Si : H produced by high-temperature thermal decomposition of silaneJournal of Applied Physics, 1979