Preparation of titanium nitride by a pulsed d.c. magnetron reactive deposition techniques using the moving mode of deposition
- 1 October 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 72 (3), 535-540
- https://doi.org/10.1016/0040-6090(80)90544-1
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Microstructures of TiN and Ti2N deposits prepared by activated reactive evaporationThin Solid Films, 1979
- TiN as a diffusion barrier in the Ti-Pt-Au beam-lead metal systemThin Solid Films, 1979