Sputtering of Ta2O5 by Ar+ ions at energies below 1 keV
- 2 September 1978
- journal article
- Published by Elsevier in Surface Science
- Vol. 76 (2), 343-354
- https://doi.org/10.1016/0039-6028(78)90102-4
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
- Sputtered neutral mass spectrometry (SNMS) as a tool for chemical surface analysis and depth profilingApplied Physics B Laser and Optics, 1977
- Ion-impact chemistry in the system titanium-oxygen (studies on bombardment-enhanced conductivity—III)Journal of Physics and Chemistry of Solids, 1975
- Mass spectrometry of neutral molecules sputtered from polycrystalline metals by Ar+-ions of 100?1000 eVZeitschrift für Physik B Condensed Matter, 1975
- Criteria for bombardment-induced structural changes in non-metallic solidsRadiation Effects, 1975
- X-ray photoelectron spectroscopic studies of nickel-oxygen surfaces using oxygen and argon ion-bombardmentSurface Science, 1974
- Investigation of surface reactions by the static method of secondary ion mass spectrometry: III. The oxidation of vanadium, niobium and tantalum in the monolayer rangeSurface Science, 1973
- The sputtering of oxides part i: a survey of the experimental resultsRadiation Effects, 1973
- Procedure for Stripping Anodic Oxide Films from Tantalum and NiobiumReview of Scientific Instruments, 1964
- Modification of the lunar surface by the solar-wind bombardmentPlanetary and Space Science, 1963
- Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 evJournal of Applied Physics, 1961